平板反应架:实现薄膜薄片焦耳热
点击:0 时间:2022-11-24 15:31:23
注意:本反应架已申请实用新型专利和外观专利保护!
(1)LLZTO石榴石SSE快速合成和烧结的典型UHS工艺,中等加热速率为约20000°C/min(约5秒,从室温至约1500°C),在约1500°F下烧结约6秒
Typical UHS process for rapid synthesis and sintering of LLZTO garnet SSE, with a moderate heating rate of ~20,000 °C/min (~5 s, from RT to ~1,500 °C) and ~6 s sintering at ~1,500 °C
(2)用于快速合成和烧结3D打印SiOC的典型UHS工艺,加热速度约为2400°C/min(约30秒,从室温至约1200°C),在约1200°C下烧结约10秒
Typical UHS process for rapid synthesis and sintering of 3D printed SiOC, with a heating rate of ~2,400 °C/min (~30 s, from RT to ~1,200 °C) and ~10 s sintering at ~1,200 °C.
摘自:A general method to synthesize and sinter bulk ceramics in seconds,SCIENCE, 1 May 2020 Vol 368, Issue 6490,pp. 521-526, DOI: 10.1126/science.aaz7681
《Science》原论文和支持信息的PDF下载:
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